Chinese researchers successfully completed the R&D and application of 90-65nm PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment under the support of the National Science and Technology Major Project of ¡°Super Large-Scale IC Manufacturing Equipment and Sets of Techniques¡±. The technological breakthrough means that China has become capable of localizing the production of 12-inch PECVD equipment and strengthened the overall competitiveness of the domestic integrated circuit industry.
As the core equipment of IC manufacturing, PECVD is costly and technically difficult. Under the support of the National Science and Technology Major Project, Chinese enterprises and research institutes have managed to overcome key technological obstacles. The research team filed 307 patent applications and formulated 10 technical standards, and the 12-inch PECVD equipment was recognized as a key national new product. The product has passed production verification test and purchase test.In line with international standards, the product cost 30% less than similar foreign equipment.
So far seven sets of 12-inch PECVD equipment have been sold and five have already been delivered to clients, who turned out to be satisfied with the product and service.